Skip to main content

1 Result(s)

within Chapter Remove this filter Sukbae Joo Remove this filter

and

  1. No Access

    Chapter

    Tribology in Chemical–Mechanical Planarization

    Chemical–mechanical planarization (CMP) is one of the most important process steps in making integrated circuits. Tribology plays significant roles in material removal, polishing, and planarization. This chapt...

    Sukbae Joo, Hong Liang in Tribology for Scientists and Engineers (2013)