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Chapter and Conference Paper
Atomic Structure of (Ge0.2Se0.8)85B15 and (Ge0.2Se0.8)85In15 Glasses
The atomic structure of (Ge0.2Se0.8)85B15 and (Ge0.2Se0.8)85In15 chalcogenide glasses has been studied with X-ray diffraction, neutron diffraction and extended X-ray absorption fine structure measurements. The re...
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Chapter
Advanced Barriers for Copper Interconnects
Both Ta-Si-N and W-Si-N films have promising properties as diffusion barriers for copper metallization. For Ta-Si-N films with a silicon content of ∼ 20 at%, as an optimised system regarding thermal stability ...