Page
%P
![Loading...](https://link.springer.com/static/c4a417b97a76cc2980e3c25e2271af3129e08bbe/images/pdf-preview/spacer.gif)
-
Chapter
Heteroepitaxy of Layered III–VI Semiconductor GaSe on Si(111)-7×7 Surface
The new concept of overlayer growth named van der Waals epitaxy (vdWE) emerged with the initial work of Koma [1], in which the constraints imposed by the lattice mismatch have been shown to be removed by using th...