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Article
Damage to Crystalline Silicon Following Implantation by Low Energy Silicon Ions
A new approach to investigate low energy defect formation and annealing in a crystal is developed, based on experimental observations of the total number of interstitials. The model is applied to damage in cry...
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Article
Damage-to-dose ratio after low energy silicon ion implantation into crystalline silicon
In this work, we develop a model describing the diffusion of vacancies and self-interstitials and their recombination during ion implantation. The model includes the effect of the moving surface due to regrowt...
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Article
Machining of coarse grained and ultra fine grained titanium
Machining of titanium is quite difficult and expensive. Heat generated in the process of cutting does not dissipate quickly, which affects tool life. In the last decade ultra fine grained (UFG) titanium has em...