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Article

Nanoparticle Formation in Zn⁺ and O⁺ Ion Sequentially Implanted SiO₂ Film

The ⁶⁴Zn⁺ and ¹⁶O⁺ ions were implanted in SiO₂ film on Si substrate with next parameters: the implant dose was 5.0 × 1016 cm^–2, for Zn⁺ ions the energy was 50 keV and for O⁺ ions the energy was 16 keV. Than the s...

V. V. Privezentsev, A. V. Makunin, A. A. Batrakov, S. V. Ksenich… in Semiconductors (2018)