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    Article

    Evaluation of focused O+ ion beams as a tool for making resist masks by reactive etching

    A method of reactive etching is proposed in which focused 100-eV O+ ion beams are used for making organic-resist masks 12–24 nm thick with nanometer-sized apertures. Focused-ion-beam and ion-projection-lithograph...

    V. A. Zhukov, A. I. Titov, N. T. Bagraev, M. M. Nesterov in Russian Microelectronics (2006)

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    Article

    Delta-Do** of Monocrystalline Semiconductors by Al and Sb Implantation Using FIB Resistless Lithography

    The potential is investigated of FIB lithography for implantation delta-do** in order to produce desired arrangements of quantum wires and dots. Both raster and vector scanning are considered. The results ar...

    V. A. Zhukov, N. T. Bagraev, A. I. Titov, E. E. Zhurkin in Russian Microelectronics (2004)