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Article
Applications of atomic layer chemical vapor deposition for the processing of nanolaminate structures
Atomic layer chemical vapor deposition (ALCVD) is a variant of a CVD process that involves surface deposition for the controlled growth of nano-thickness films. ALCVD is based on the self-limiting surface reac...
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Article
Non-vacuum deposition of CIGS absorber films for low-cost thin film solar cells
Thin film solar cells composed of chalcopyrite Cu(In1−x Ga x )(Se1−y S y )2 (CIGSSe) absorbers h...
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Article
Design and roles of RGO-wrap** in charge transfer and surface passivation in photoelectrochemical enhancement of cascade-band photoanode
Fast charge transfer and anti-photocorrosion are two crucial factors for develo** efficient, durable photoanodes for photoelectrochemical (PEC) cells. Reduced graphene oxide (RGO) is a promising photoanode e...
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Article
Effects of oxygen plasma generated in magnetron sputtering of ruthenium oxide on pentacene thin film transistors
Effects of oxygen plasma generated in a sputtering process for deposition of electrodes on pentacene thin films to configure top-contact (TC) transistors have been thoroughly investigated. Reactive oxygen spec...