![Loading...](https://link.springer.com/static/c4a417b97a76cc2980e3c25e2271af3129e08bbe/images/pdf-preview/spacer.gif)
-
Article
Applications of atomic layer chemical vapor deposition for the processing of nanolaminate structures
Atomic layer chemical vapor deposition (ALCVD) is a variant of a CVD process that involves surface deposition for the controlled growth of nano-thickness films. ALCVD is based on the self-limiting surface reac...
-
Article
Non-vacuum deposition of CIGS absorber films for low-cost thin film solar cells
Thin film solar cells composed of chalcopyrite Cu(In1−x Ga x )(Se1−y S y )2 (CIGSSe) absorbers h...
-
Article
CH3CH2OH, CD3CD2OD, and CF3CH2OH Decomposition on ZnO \( \left( {1\bar{1}00} \right) \)
The decomposition of CH3CH2OH, CD3CD2OD, and CF3CH2OH on Zn \( \left( {1\bar{1}00} \right) \) ...
-
Article
Effects of oxygen plasma generated in magnetron sputtering of ruthenium oxide on pentacene thin film transistors
Effects of oxygen plasma generated in a sputtering process for deposition of electrodes on pentacene thin films to configure top-contact (TC) transistors have been thoroughly investigated. Reactive oxygen spec...