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    Direct top–down fabrication of nanoscale electrodes for organic semiconductors using fluoropolymer resists

    We report the use of a fluoropolymer resist for the damage-free e-beam lithographic patterning of organic semiconductors. The same material is also shown to be suitable as an orthogonal electron beam resist fo...

    Jungho Park, Jonathan Ho, Hoyeol Yun, Myeong** Park, Jung Hyun Lee in Applied Physics A (2013)