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    Selective and low temperature synthesis of polycrystalline diamond

    Polycrystalline diamond thin films have been deposited on single crystal silicon substrates at low temperatures (⋚ 600 °C) using a mixture of hydrogen and methane gases by high pressure microwave plasma-assist...

    R. Ramesham, T. Roppel, C. Ellis, D. A. Jaworske, W. Baugh in Journal of Materials Research (1991)

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    Low Temperature Synthesis of Polycrystalline Diamond by Microwave Plasma-Enhanced Chemical Vapor Deposition

    Polycrystalline diamond thin films have been deposited on single crystal silicon substrates at low temperatures (<950°C) using a mixture of methane and hydrogen gases by high pressure microwave plasma assisted...

    R. Ramesham, C. Ellis, T. Roppel, D.A. Jaworske, W. Baugh in MRS Online Proceedings Library (1990)

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    Article

    Selective deposition of diamond films

    Polycrystalline diamond films have been selectively deposited on a silicon surface. A novel process was developed which exposes a patterned, scratch damaged silicon area, surrounded by SiO2, to a high pressure mi...

    J. L. Davidson, C. Ellis, R. Ramesham in Journal of Electronic Materials (1989)

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