Atomic Layer Deposition

  • Reference work entry
Encyclopedia of Nanotechnology
  • 1095 Accesses

Abstract

ALD; Atomic layer chemical vapor deposition; Atomic layer CVD (AL-CVD); Atomic layer epitaxy (ALE); Molecular layer deposition (MLD)

This is a preview of subscription content, log in via an institution to check access.

Access this chapter

Subscribe and save

Springer+ Basic
EUR 32.99 /Month
  • Get 10 units per month
  • Download Article/Chapter or Ebook
  • 1 Unit = 1 Article or 1 Chapter
  • Cancel anytime
Subscribe now

Buy Now

Chapter
EUR 29.95
Price includes VAT (Germany)
  • Available as PDF
  • Read on any device
  • Instant download
  • Own it forever
eBook
EUR 1,284.00
Price includes VAT (Germany)
  • Available as EPUB and PDF
  • Read on any device
  • Instant download
  • Own it forever

Tax calculation will be finalised at checkout

Purchases are for personal use only

Institutional subscriptions

Similar content being viewed by others

References

  1. Ritala, M., Niinistö, J.: Atomic layer deposition. In: Jones, A.C., Hitchman, M.L. (eds.) Chemical Vapor Deposition: Precursors, Processes and Application, pp. 158–206. Royal Society of Chemistry, Cambridge (2009)

    Google Scholar 

  2. Ritala, M., Leskelä, M.: Atomic layer deposition. In: Nalwa, H.S. (ed.) Handbook of Thin Film Materials, vol. 1, pp. 103–159. Academic, New York (2002)

    Google Scholar 

  3. Puurunen, R.L.: Surface chemistry of atomic layer deposition: a case study for the trimethylaluminum/water process. J. Appl. Phys. 97, 121301 (2005)

    Google Scholar 

  4. George, S.M.: Atomic layer deposition: an overview. Chem. Rev. 110, 111–131 (2010)

    CAS  Google Scholar 

  5. Kim, H.: Atomic layer deposition of metal and nitride thin films: current research efforts and applications for semiconductor device processing. J. Vac. Sci. Technol. B 21, 2231–2261 (2003)

    CAS  Google Scholar 

  6. George, S.M., Yoon, B., Dameron, A.A.: Surface chemistry for molecular layer deposition of organic and hybrid organic-inorganic polymers. Acc. Chem. Res. 42, 498–508 (2009)

    CAS  Google Scholar 

  7. Knoops, H.C.M., Langereis, E., van de Sanden, M.C.M., Kessels, W.M.M.: Conformality of plasma-assisted ALD: physical processes and modeling. J. Electrochem. Soc. 157, G241–G249 (2010)

    CAS  Google Scholar 

  8. Ritala, M., Niinistö, J.: Industrial applications of atomic layer deposition. ESC Trans. 902, 2564–2579 (2009)

    Google Scholar 

  9. Stoldt, C.R., Bright, V.M.: Ultra-thin film encapsulation processes for micro-electro-mechanical devices and system. J. Phys. D Appl. Phys. 39, R-163–R-170 (2006)

    CAS  Google Scholar 

  10. Knez, M., Nielsch, K., Niinistö, L.: Synthesis and surface engineering of complex nanostructures by atomic layer deposition. Adv. Mater. 19, 3425–3438 (2007)

    CAS  Google Scholar 

Download references

Author information

Authors and Affiliations

Authors

Corresponding author

Correspondence to Charles L. Dezelah IV .

Editor information

Editors and Affiliations

Rights and permissions

Reprints and permissions

Copyright information

© 2012 Springer Science+Business Media B.V.

About this entry

Cite this entry

Dezelah, C.L. (2012). Atomic Layer Deposition. In: Bhushan, B. (eds) Encyclopedia of Nanotechnology. Springer, Dordrecht. https://doi.org/10.1007/978-90-481-9751-4_372

Download citation

Publish with us

Policies and ethics

Navigation