Abstract
The tremendous progress in the development and deployment of lab scale extreme ultraviolet (EUV) sources over the past decade has opened up the door to a wide variety of new users beyond the traditional synchrotron community. The practical use of such sources, however, is heavily dependent on the availability of EUV optical components. In this manuscript, we describe recent advances at Berkeley Lab in the development of reflective and diffractive optical structures for imaging, wavefront encoding, metrology, spectral filtering, and more.
This is a preview of subscription content, log in via an institution to check access.
Access this chapter
Tax calculation will be finalised at checkout
Purchases are for personal use only
Similar content being viewed by others
References
Reagan, B.A., Wernsing, K.A., Curtis, A.H., Furch, F.J., Luther, B.M., Patel, D., Menoni, C.S., Rocca, J.J.: Demonstration of a 100-Hz repetition rate gain-saturated diode-pumped table-top soft x-ray laser. Opt. Lett. 37, 3624 (2012)
Zhang, X., Libertun, A.R., Paul, A., Gagnon, E., Backus, S., Christov, I.P., Murnane, M.M., Kapteyn, H.C., Bartels, R.A.: Highly coherent light at 13Â nm generated by use of quasi-phase-matched high-harmonic generation. Opt. Lett. 29, 1357 (2004)
Kim, S., **, J., Kim, Y., Park, I., Kim, Y., Kim, S.: High-harmonic generation by resonant plasmon field enhancement. Nature. 453, 757–60 (2008)
Midorikawa, K.: High-order harmonic generation and attosecond science. Jpn. J. Appl. Phys. 50, 9001 (2011)
Spiller, E.: Reflective multilayer coatings for the far UV region. Appl. Opt. 15, 2333 (1976)
Underwood, J.H., Barbee, T.W. Jr.: Layered synthetic microstructures as Bragg diffractors for X rays and extreme ultraviolet: theory and predicted performance. Appl. Opt. 20, 3027 (1981)
Takahashi, E., Nabekawa, Y., Midorikawa, K.: Generation of 10-mJ coherent extreme-ultraviolet light by use of high-order harmonics. Opt. Lett. 27, 1920 (2002)
Aquila, A., Salmassi, F., Dollar, F., Liu, Y., Gullikson, E.: Developments in realistic design for aperiodic Mo/Si multilayer mirrors. Opt. Exp. 14, 10073 (2006)
Schmahl, G., Rudolph, D. (eds.): X-Ray Microscopy, Proceedings International Symposium, Goettingen, Germany, Sept. 14–16, 1983, Vol. 43. Springer, Berlin (1984)
Anderson, E.H., Kern, D.: Nanofabrication of zone plates for X-Ray microscopy. In: Michette, A., Morrison, G., Buckley, C. (eds.) X-Ray Microscopy III. Springer, Berlin (1992)
Anderson, E.H.: Specialized electron beam nano-lithography for EUV and X-Ray diffractive optics. IEEE J. Quantum Electron. 42, 27–35 (2006)
Chao, W., Tyliszczak, T., Kim, J., Fischer, P., Rekawa, S., Anderson, E.H.: Latest development of ultra-high resolution soft x-ray zone plate microscopy. X-Ray Microscopy X. (2010)
Kuznetsov, I., Filevich, J., Woolston, M., Bernstein, E., Crick, D., Carlton, D., Chao, W., Anderson, E., Rocca, J., Menoni, C.: Composition depth profiling by soft x-ray laser-ablation mass spectrometry. Proc. SPIE. 8849, 88490G (2013)
Kim, S., Lee, D., Park, J., Kim, E., Jeon, C., Cho, H., Jeon, B., choi, C., Anderson, C., Myakawa, R., Naulleau, P.: EUV mask imaging system based on the scanning reflective microscopy. 2013 International Symposium on Extreme Ultraviolet Lithography, Toyama, Japan, October 6–10, 2013, (proceedings available from SEMATECH, Albany, NY)
Yoo, B.: EUVO: EUV Light Generation System. 2013 International Symposium on Extreme Ultraviolet Lithography, Toyama, Japan, October 6–10, 2013, proceedings available from SEMATECH, Albany, NY
Author information
Authors and Affiliations
Corresponding author
Editor information
Editors and Affiliations
Rights and permissions
Copyright information
© 2016 Springer International Publishing Switzerland
About this paper
Cite this paper
Naulleau, P. et al. (2016). EUV Research at Berkeley Lab: Enabling Technologies and Applications. In: Rocca, J., Menoni, C., Marconi, M. (eds) X-Ray Lasers 2014. Springer Proceedings in Physics, vol 169. Springer, Cham. https://doi.org/10.1007/978-3-319-19521-6_38
Download citation
DOI: https://doi.org/10.1007/978-3-319-19521-6_38
Published:
Publisher Name: Springer, Cham
Print ISBN: 978-3-319-19520-9
Online ISBN: 978-3-319-19521-6
eBook Packages: Physics and AstronomyPhysics and Astronomy (R0)