Abstract
The problems of growing short-period InAs/GaSb superlattices on GaSb (100) substrates by molecular-beam epitaxy are studied. For InAs/GaSb epitaxial heterostructures, a method for forming “InSb-like” atomically smooth interfaces with an ultrathin intermediate In(As)Sb layer is developed. This technique allowed growth of a short-period superlattice containing 50 InAs/GaSb periods. In situ growth control using high-energy electron diffraction and post-growth studies of the superlattice using atomic-force microscopy and X-ray diffraction confirm the efficiency of the technique for fabricating detector structures based on type-II superlattices.
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Translated by A. Kazantsev
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Krivobok, V.S., Pashkeev, D.A., Klekovkin, A.V. et al. Interface Design Development for Growing Short-Period InAs/GaSb Superlattices by Molecular-Beam Epitaxy. Bull. Lebedev Phys. Inst. 50, 396–402 (2023). https://doi.org/10.3103/S1068335623090051
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DOI: https://doi.org/10.3103/S1068335623090051