Abstract
We report the growth of tritium induced defects in tritium doped hydrogenated amorphous silicon (a-Si:H.T) as measured by electron spin resonance (ESR) and photothermal deflection spectroscopy (PDS). The measurements allow one to examine the accumulation of defects in a-Si:H.T where the defect production mechanism is known. Defects produced by tritium decay are found to be much less numerous than the number of decayed tritium atoms and they are metastable like Staebler-Wronski defects. These results provide new insight into the metastable defect creation and the role of hydrogen motion.
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Acknowledgments
Work at the University of Utah was supported by NREL under subcontract #ADJ-2-30630-23 and NSF under grant #DMR-0073004.
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Whitaker, J., Viner, J., Zukotynski, S. et al. Tritium Induced Defects in Amorphous Silicon. MRS Online Proceedings Library 808, 89–94 (2003). https://doi.org/10.1557/PROC-808-A2.4
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DOI: https://doi.org/10.1557/PROC-808-A2.4