SpringerLink
Log in

Process-Property Relationships For a-Si1-xCx:H Deposition: Excursions in Parameter Space Guided by Real Time Spectroellipsometry

  • Published:
MRS Online Proceedings Library Aims and scope

Abstract

Real time spectroellipsometry (RTSE) has been applied to study the growth of a-Si1-xCx:H alloys (x~0.1; Eg=1.90-2.00 eV) for applications as i- and p-type layers in wide band gap solar cells. Two important material parameters, the optical gap and the relative bond-packing density (or void volume fraction), can be estimated from RTSE data collected during the growth of a sequence of layers onto the same substrate using different plasma-enhanced CVD conditions. In this way, large regions of parameter space have been scanned expeditiously, and an improved understanding of the effects of H2-dilution, substrate temperature (Ts), plasma power, gas pressure, and gas flow on the film properties has been obtained.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Log in via an institution

Subscribe and save

Springer+ Basic
EUR 32.99 /Month
  • Get 10 units per month
  • Download Article/Chapter or Ebook
  • 1 Unit = 1 Article or 1 Chapter
  • Cancel anytime
Subscribe now

Buy Now

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Institutional subscriptions

Similar content being viewed by others

References

  1. Y. Kuwano, in: Plasma Deposited Thin Films, edited by J. Mort and F. Jansen (CRC, Boca Raton, FL 1986) p. 161.

  2. A. Matsuda and K. Tanaka, J. Non-Cryst. Solids 97&98, 1367 (1987).

    Article  Google Scholar 

  3. S.S. Camargo and W. Beyer, J. Non-Cryst. Solids 114, 807 (1989).

    Article  CAS  Google Scholar 

  4. S.H. Baker, W.E. Spear, and R.A.G. Gibson, Philos. Mag. B 62, 213 (1990).

    Article  CAS  Google Scholar 

  5. F. Alvarez, M. Sebastiani, F. Pozzilli, P. Fiorini, and F. Evangelisti, J. Appl. Phys. 71, 267 (1992).

    Article  CAS  Google Scholar 

  6. Y. Lu, I. An, M. Gunes, M. Wakagi, C.R. Wronski, and R.W. Collins, Appl. Phys. Lett. 63, 2228 (1993).

    Article  CAS  Google Scholar 

  7. Yuan-Min Li, Mater. Res. Soc. Symp. Proc. 297, 803 (1993).

    Article  CAS  Google Scholar 

  8. R.W. Collins, Rev. Sci. Instrum. 61, 2029 (1990).

    Article  CAS  Google Scholar 

  9. K. Mui, D.K. Basa, F.W. Smith and R. Corderman, Phys. Rev. B 35, 8089 (1987); au[9a]_K. Mui and F.W. Smith, Phys. Rev. B 38, 10623 (1988).

    Article  CAS  Google Scholar 

  10. Y.M. Li, I. An, H.V. Nguyen, C.R. Wronski, and R.W. Collins, Phys. Rev. Lett. 68, 2814 (1992).

    Article  CAS  Google Scholar 

  11. G.D. Cody in: Semiconductors and Semimetals, Vol. 21B, edited by J.I. Pankove (Academic Press, New York, 1984) Chapt. 2.

  12. G. Weiser and H. Mell J. Non-Cryst. Solids 114, 298 (1989).

    Article  CAS  Google Scholar 

  13. W. Luft and Y.S. Tsuo, Hydrogenated AMorphous Silicon Alloy Deposition Processes, (Marcel Dekker, New York, 1993).

    Google Scholar 

Download references

Author information

Authors and Affiliations

  1. Materials Research Laboratory, Department of Electrical Engineering, and The Pennsylvania State University, University Park, PA, 16802, USA

    Yiwei Lu, Mehmet Gunes, Yeeheng Lee & C. R. Wronski

  2. Materials Research Laboratory, Department of Physics, The Pennsylvania State University, University Park, PA, 16802, USA

    Sangbo Kim & R. W. Collins

Authors
  1. Yiwei Lu
    View author publications

    You can also search for this author in PubMed Google Scholar

  2. Sangbo Kim
    View author publications

    You can also search for this author in PubMed Google Scholar

  3. Mehmet Gunes
    View author publications

    You can also search for this author in PubMed Google Scholar

  4. Yeeheng Lee
    View author publications

    You can also search for this author in PubMed Google Scholar

  5. C. R. Wronski
    View author publications

    You can also search for this author in PubMed Google Scholar

  6. R. W. Collins
    View author publications

    You can also search for this author in PubMed Google Scholar

Rights and permissions

Reprints and permissions

About this article

Cite this article

Lu, Y., Kim, S., Gunes, M. et al. Process-Property Relationships For a-Si1-xCx:H Deposition: Excursions in Parameter Space Guided by Real Time Spectroellipsometry. MRS Online Proceedings Library 336, 595–600 (1994). https://doi.org/10.1557/PROC-336-595

Download citation

  • Published:

  • Issue Date:

  • DOI: https://doi.org/10.1557/PROC-336-595

Search

Navigation