Abstract
Transmission electron microscopy (TEM) study was performed to investigate the interface region of AlN/6H-SiC. Thick AlN layers were grown on a 3.5° off-axis 6H-SiC substrate at a temperature of 1790 °C for 100 hours by sublimation-recondensation method. The energy dispersive x-ray spectroscopy (EDXS) analysis indicated considerable amount of aluminum and nitrogen present in the substrate and Si and C present in AlN. Lattice images of cross-sectional TEM samples show a faceted interface with step growth.
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Chaudhuri, J., Nyakiti, L.O., Lu, P. et al. Transmission Electron Microscopy Study of Interface Region of Aln / 6H-Sic. MRS Online Proceedings Library 1040, 1005 (2007). https://doi.org/10.1557/PROC-1040-Q10-05
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DOI: https://doi.org/10.1557/PROC-1040-Q10-05