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Wet oxidation kinetics of AlAs at elevated temperatures

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Abstract

Wet oxidation in the AlAs layer sandwiched between two GaAs plates was investigated for the temperature range of 400 to 480 °C. The oxidation rate increased with increasing thickness of the AlAs layer. Theoretical analysis based on the boundary layer diffusion was performed to account for the thickness effect. The theory is in excellent agreement with the experimental measurement.

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References

  1. J.M. Dallesasse and N. Holonyak, Jr., Appl. Phys. Lett. 58, 394 (1991).

    Article  CAS  Google Scholar 

  2. F.A. Kish, S.J. Caracci, N. Holonyak, Jr., J.M. Dallesasse, K.C. Hsieh, M.J. Ries, S.C. Smith, and R.D. Burnham, Appl. Phys. Lett., 59, 1755 (1991).

    Article  CAS  Google Scholar 

  3. S.A. Maranowski, F.A. Kish, S.J. Caracci, N. Holonyak, Jr., J.M. Dallesasse, D.P. Bour, and D.W. Treat, Appl. Phys. Lett. 61, 1688 (1992).

    Article  Google Scholar 

  4. K.L. Lear, K.D. Choquette, R.P. Schneider, Jr., S.P. Kilcogyn, and K.M. Geib, Electron Lett. 31, 208 (1995).

    Article  CAS  Google Scholar 

  5. G.M. Yang, M.H. MacDougal, P.D. Daphus, Electron Lett. 31, 886 (1995).

    Article  CAS  Google Scholar 

  6. K.D. Choquette, R.P. Schneider, M.H. Crawford, K.M. Geib, and J.J. Figiel, Electron Lett. 31, 1145 (1995).

    Article  CAS  Google Scholar 

  7. K.D. Choquette, K.L. Lear, R.P. Schneider, and K.M. Geib, Appl. Phys. Lett. 66, 3414 (1995).

    Article  Google Scholar 

  8. H. Nickel, J. Appl. Phys. 78, 5201 (1995).

    Article  CAS  Google Scholar 

  9. M. Ochiai, G.E. Giudice, H. Temkin, J.W. Scott, and T M. Cockerill, Appl. Phys. Lett. 68, 1898 (1996).

    Article  CAS  Google Scholar 

  10. M.J. Cich, R. Zhao, E.H. Anderson, and E.R. Weber, J. Appl. Phys. 91, 121 (2002).

    Article  CAS  Google Scholar 

  11. A.C. Alonzo, X-C. Cheng, T.C. McGill, J. Appl. Phys. 84, 6901 (1998).

    Article  CAS  Google Scholar 

  12. S.A. Feld, J.P. Loehr, R.E. Sherriff, J. Wiemeri, and R. Kaspi, IEEE Photo. Tech. Lett. 10, 197 (1998).

    Article  Google Scholar 

  13. R.L. Naone and L.A. Coldren, J. Appl. Phys. 82, 2277 (1997).

    Article  CAS  Google Scholar 

  14. M.H. MacDougal, H. Zhao, P.D. Dapkus, M. Ziari, and W.H. Steier, Electron. Lett. 30, 1147 (1994).

    Article  CAS  Google Scholar 

  15. T. Takamori, K. Takemasa, and T. Kamijoh, Appl. Phys. Lett. 69, 659 (1996).

    Article  CAS  Google Scholar 

  16. R.T.P. Whipple, Philos. Mag. 45, 1225 (1954).

    Article  CAS  Google Scholar 

  17. G.H. Gilmer and H.H. Farrell, J. Appl. Phys. 47, 3792 (1976).

    Article  CAS  Google Scholar 

  18. W.L. Wang, Y.T. Chou, and S. Lee, J. Mater. Res. 16, 1967 (2001).

    Article  CAS  Google Scholar 

  19. T.E. Schlesinger and T. Kuech, Appl. Phys. Lett. 49, 520 (1986).

    Article  Google Scholar 

  20. C.I.H. Ashby, J.P. Sullivan, K.D. Choqette, K.M. Geib, and H.Q. Hou, J. Appl. Phys. 82, 3134 (1997).

    Article  CAS  Google Scholar 

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Authors and Affiliations

  1. Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu, Taiwan, Republic of China

    Sun-Chien Ko & Sanboh Lee

  2. Advanced Technology Research Laboratory, Telecommunication Laboratories, Chunghwa Telecom Company, Taoyuan, Taiwan, Republic of China

    Hai-Lin Wang

  3. Department of Chemical Engineering and Materials Science, University of California, 92697, Irvine, California, USA

    Y. T. Chou

Authors
  1. Sun-Chien Ko
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  2. Sanboh Lee
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  3. Hai-Lin Wang
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  4. Y. T. Chou
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Ko, SC., Lee, S., Wang, HL. et al. Wet oxidation kinetics of AlAs at elevated temperatures. Journal of Materials Research 18, 1027–1030 (2003). https://doi.org/10.1557/JMR.2003.0140

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  • DOI: https://doi.org/10.1557/JMR.2003.0140

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