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Grain size, Grain Uniformity, and (111) Texture Enhancement by Solid-phase Crystallization of F- and C-implanted SiGe Films

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Abstract

The crystallization kinetics and film microstructure of poly-SiGe layers obtained by solid-phase crystallization of unimplanted and C- and F-implanted 100-nm-thick amorphous SiGe films deposited by low-pressure chemical vapor deposition on thermally oxidized Si wafers were studied. After crystallization, the F- and C-implanted SiGe films showed larger grain sizes, both in-plane and perpendicular to the surface of the sample, than the unimplanted SiGe films. Also, the (111) texture was strongly enhanced when compared to the unimplanted SiGe or Si films. The crystallized F-implanted SiGe samples showed the dendrite-shaped grains characteristic of solid-phase crystallized pure Si. The structure of the unimplanted SiGe and C-implanted SiGe samples consisted of a mixture of grains with well-defined contour and a small number of quasi-dendritic grains. These samples also showed a very low grain-size dispersion.

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Authors and Affiliations

  1. Departamento de Tecnología Electrónica, E.T.S.I. de Telecomunicación, Universidad Politécnica de Madrid, Ciudad Universitaria s/n, 28040, Madrid, Spain

    A. Rodríguez, J. Olivares, C. González, J. Sangrador & T. Rodríguez

  2. Departamento de Física, E.P.S., Universidad Carlos III, Avenida de la Universidad 30, 28911, Leganés (Madrid), Spain

    C. Ballesteros

  3. Department of Electronic and Electrical Engineering, University of Surrey, Guildford, Surrey, GU2 5XH, United Kingdom

    R. M. Gwilliam

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  1. A. Rodríguez
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  2. J. Olivares
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  3. C. González
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  4. J. Sangrador
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  5. T. Rodríguez
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  6. C. Ballesteros
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  7. R. M. Gwilliam
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Rodríguez, A., Olivares, J., González, C. et al. Grain size, Grain Uniformity, and (111) Texture Enhancement by Solid-phase Crystallization of F- and C-implanted SiGe Films. Journal of Materials Research 15, 1630–1634 (2000). https://doi.org/10.1557/JMR.2000.0234

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  • DOI: https://doi.org/10.1557/JMR.2000.0234

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