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Ion beam enhanced thermal depolymerization of poly(methyl methacrylate)

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Abstract

Ion beam enhanced thermal depolymerization of poly(methyl methacrylate) thin films, 1–2 µm thick, has been studied in the temperature range 100–400 °C using a 300 keV He+ beam at very low fluence (5 × 1010−5 × 1011 ions cm−2). A relevant monomer evolution (mass signal m/z = 100) at temperature (150 °C) well below the conventional degradation temperature (360 °C) has been detected during irradiation. The observed phenomenon is discussed in terms of activation energies and diffusion processes within the investigated films. The possibility offered by this phenomenon of performing a microlithography process in only one step is discussed.

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Authors and Affiliations

  1. Dipartimento di Scienze Chimiche dell’ Università di Catania, Viale A. Doria, 6-95125, Catania, Italy

    M. E. Fragalà, G. Compagnini & O. Puglisi

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  1. M. E. Fragalà
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  2. G. Compagnini
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  3. O. Puglisi
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Fragalà, M.E., Compagnini, G. & Puglisi, O. Ion beam enhanced thermal depolymerization of poly(methyl methacrylate). Journal of Materials Research 14, 228–231 (1999). https://doi.org/10.1557/JMR.1999.0034

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  • DOI: https://doi.org/10.1557/JMR.1999.0034

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