Abstract
A simple and effective method is developed for synchronous recording of an interference signal to measure the thickness of a layer grown on a rotating substrate in molecular_beam epitaxy apparatus. The separation of the information component of the signal from the noise induced by the rotation of a substrate (conditioning of the signal) increases the accuracy of recording the interference signal coming to a layer thickness calculation device and an automatic system of process management and, thus, increases the quality and reproducibility of film structures.
This is a preview of subscription content, log in via an institution to check access.
References
G. S. Landsberg, Optics (Nauka, Moscow, 1976) [in Russian].
O. Du-Nour, Patent No. RU2001107968 (May 20, 2003).
S. E. Aleksandrov, G. A. Gavrilov, et al., RF Patent No. 73728 (2007).
Author information
Authors and Affiliations
Corresponding author
Additional information
Original Russian Text © S.E. Aleksandrov, G.A. Gavrilov, G.Yu. Sotnikova, A.N. Alekseev, D.A. Baranov, A.P. Shkurko, 2009, published in Zhurnal Tekhnicheskoĭ Fiziki, 2009, Vol. 79, No. 7, pp. 140–143.
Rights and permissions
About this article
Cite this article
Aleksandrov, S.E., Gavrilov, G.A., Sotnikova, G.Y. et al. Measurement of the layer thickness on rotating substrates in molecular-beam epitaxy apparatus. Tech. Phys. 54, 1066–1069 (2009). https://doi.org/10.1134/S106378420907024X
Received:
Published:
Issue Date:
DOI: https://doi.org/10.1134/S106378420907024X