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Multiple processes during the sputtering of materials by ion bombardment

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Abstract

A new method of statistical analysis dedicated to filling the gap between dynamic and thermodynamic theories of secondary-particle emission under ion bombardment is proposed. Expressions for the average number of emitted atomic particles and electrons are obtained, and the relationships between their yields are established.

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Authors and Affiliations

  1. Institute of Ion-Plasma and Laser Technology, Uzbek Academy of Sciences, Tashkent, 100125, Uzbekistan

    B. L. Oksengendler, S. E. Maksimov & N. Yu. Turaev

  2. Institute of Chemistry and Physics of Polymers, Uzbek Academy of Sciences, Tashkent, 100128, Uzbekistan

    N. N. Turaeva

Authors
  1. B. L. Oksengendler
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  2. S. E. Maksimov
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  3. N. N. Turaeva
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  4. N. Yu. Turaev
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Corresponding author

Correspondence to B. L. Oksengendler.

Additional information

Original Russian Text © B.L. Oksengendler, S.E. Maksimov, N.N. Turaeva, N.Yu. Turaev, 2013, published in Poverkhnost’. Rentgenovskie, Sinkhrotronnye i Neitronnye Issledovaniya, 2013, No. 6, pp. 60–64.

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Oksengendler, B.L., Maksimov, S.E., Turaeva, N.N. et al. Multiple processes during the sputtering of materials by ion bombardment. J. Surf. Investig. 7, 557–561 (2013). https://doi.org/10.1134/S1027451013020419

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  • DOI: https://doi.org/10.1134/S1027451013020419

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