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Silicon Electrodeposition from Low-Melting LiCl–KCl–CsCl Melts

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Abstract

The possibility of silicon electrodeposition using LiCl–KCl–CsCl–LiF–K2SiF6 and LiCl–KCl–CsCl–K2SiF6 electrolytes is investigated. The kinetics of silicon electrowinning on glassy carbon at a temperature of 480–550°C is studied by voltammetry. Silicon electrodeposition under experimental conditions is found to proceed in one four-electron stage and to be not electrochemically reversible. The results of electrochemical measurements are used to estimate the diffusion coefficients of silicon ions in LiCl–KCl–CsCl melts (3.2 × 10–5, 7.2 × 10–6 cm2/s at temperatures of 480, 550°C, respectively) and select conditions for silicon electrodeposition. The structure and morphology of the silicon deposits formed under potentiostatic conditions are investigated. A decrease in the lithium chloride concentration in the melt is shown to result in silicon deposits in the form of dendrites and fibers.

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ACKNOWLEDGMENTS

Spectral analysis and differential scanning calorimetry of electrolyte samples were performed using the equipment and techniques of the Matter Composition Center for Collective Use at the Institute of High-Temperature Electrochemistry, Ural Branch of the Russian Academy of Sciences.

Funding

The work was performed under agreement no. 075-03-2020-582/1 of February 18, 2020 (project no. 0836-2020-0037).

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Correspondence to O. B. Pavlenko.

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The authors declare that they have no conflicts of interest.

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Translated by T. Gapontseva

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Pavlenko, O.B., Ustinova, Y.A., Zhuk, S.I. et al. Silicon Electrodeposition from Low-Melting LiCl–KCl–CsCl Melts. Russ. Metall. 2022, 818–824 (2022). https://doi.org/10.1134/S0036029522080109

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  • DOI: https://doi.org/10.1134/S0036029522080109

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