SpringerLink
Log in

The future of two-dimensional semiconductors beyond Moore’s law

  • Review Article
  • Published:

From Nature Nanotechnology

View current issue Submit your manuscript

Abstract

The primary challenge facing silicon-based electronics, crucial for modern technological progress, is difficulty in dimensional scaling. This stems from a severe deterioration of transistor performance due to carrier scattering when silicon thickness is reduced below a few nanometres. Atomically thin two-dimensional (2D) semiconductors still maintain their electrical characteristics even at sub-nanometre scales and offer the potential for monolithic three-dimensional (3D) integration. Here we explore a strategic shift aimed at addressing the scaling bottleneck of silicon by adopting 2D semiconductors as new channel materials. Examining both academic and industrial viewpoints, we delve into the latest trends in channel materials, the integration of metal contacts and gate dielectrics, and offer insights into the emerging landscape of industrializing 2D semiconductor-based transistors for monolithic 3D integration.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Log in via an institution

Subscribe and save

Springer+ Basic
EUR 32.99 /Month
  • Get 10 units per month
  • Download Article/Chapter or Ebook
  • 1 Unit = 1 Article or 1 Chapter
  • Cancel anytime
Subscribe now

Buy Now

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Institutional subscriptions

Fig. 1: Historical evolution of gate length and transistor density plotted with the roadmap set by IRDS.
Fig. 2: The simplified process flow of a 2D TMD-based multisheet FET.
Fig. 3: Contact structures, benchmark and measurement for 2D semiconductor devices.
Fig. 4: Future contact strategies for 2D multisheet FET.
Fig. 5: Benchmark of the various dielectric integration methods.

Similar content being viewed by others

References

  1. Moore, G. E. Cramming more components onto integrated circuits. Proc. IEEE 86, 82–85 (1998).

    Article  Google Scholar 

  2. Moore, G. E. Progress in digital integrated electronics. In Technical Digest. International Electron Devices Meeting (IEDM) 11–13 (IEEE, 1975). This article discusses the complexity of integrated circuits, identifies their manufacture, production and deployment and addresses trends to their future deployment.

  3. Hu, C. Future CMOS scaling and reliability. Proc. IEEE 81, 682–689 (1993).

    Article  Google Scholar 

  4. Packan, P. A. Pushing the limits. Science 285, 2079–2081 (1999).

    Article  CAS  Google Scholar 

  5. Pop, E., Sinha, S. & Goodson, K. E. Heat generation and transport in nanometer-scale transistors. Proc. IEEE 94, 1587–1601 (2006).

    Article  CAS  Google Scholar 

  6. Yan, R.-H., Ourmazd, A. & Lee, K. F. Scaling the Si MOSFET: from bulk to SOI to bulk. IEEE Trans. Electron Devices 39, 1704–1710 (1992).

    Article  CAS  Google Scholar 

  7. Hisamoto, D. et al. FinFET—a self-aligned double-gate MOSFET scalable to 20 nm. IEEE Trans. Electron Devices 47, 2320–2325 (2000).

    Article  CAS  Google Scholar 

  8. Singh, N. et al. High-performance fully depleted silicon nanowire (diameter ≤ 5 nm) gate-all-around CMOS devices. IEEE Electron Device Lett. 27, 383–386 (2006).

    Article  CAS  Google Scholar 

  9. Ryckaert, J., et al. Enabling sub-5 nm CMOS technology scaling thinner and taller! 2019 IEEE International Electron Devices Meeting (IEDM) 29.4.1–29.4.4 (IEEE, 2019).

  10. The International Technology Roadmap for Semiconductors (ITRS) 2005 Edition (SIA, 2005); https://www.semiconductors.org

  11. Reggiani, S. et al. Low-field electron mobility model for ultrathin-body SOI and double-gate MOSFETs with extremely small silicon thicknesses. IEEE Trans. Electron Devices 54, 2204–2212 (2007).

    Article  CAS  Google Scholar 

  12. International Roadmap for Devices and Systems (IRDS) 2022 Edition (IEEE, 2022); https://irds.ieee.org/editions/2022

  13. Lee, H.-H. S. & Chakrabarty, K. Test challenges for 3D integrated circuits. IEEE Des. Test. Comput. 26, 26–35 (2009).

    Article  Google Scholar 

  14. Garrou, P., Bower, C. & Ramm, P. (eds) Handbook of 3D Integration, Volume 1: Technology and Applications of 3D Integrated Circuits (Wiley, 2011).

  15. Liu, C., et al. Two-dimensional materials for next-generation computing technologies. Nat. Nanotechnol. 15, 545–557 (2020). This is an examination of the performance improvement and device innovation that are inspired by 2D materials.

  16. Liu, H., Neal, A. T. & Ye, P. D. Channel length scaling of MoS2 MOSFETs. ACS Nano 6, 8563–8569 (2012).

    Article  CAS  PubMed  Google Scholar 

  17. Shim, J. et al. Controlled crack propagation for atomic precision handling of wafer-scale two-dimensional materials. Science 362, 665–670 (2018). This article reports that monolayers of a variety of 2D materials can be cleaved from multilayers grown as 5-cm-diameter wafers.

    Article  CAS  PubMed  Google Scholar 

  18. Yu, H. et al. Wafer-scale growth and transfer of highly-oriented monolayer MoS2 continuous films. ACS Nano 11, 12001–12007 (2017).

    Article  CAS  PubMed  Google Scholar 

  19. Lin, Y.-C. et al. Wafer-scale MoS2 thin layers prepared by MoO3 sulfurization. Nanoscale 4, 6637–6641 (2012).

    Article  CAS  PubMed  Google Scholar 

  20. Kong, W. et al. Path towards graphene commercialization from lab to market. Nat. Nanotechnol. 14, 927–938 (2019). This article looks back at the past decade and gives an overview of the development history of graphene, commercial opportunities and the recent progress of graphene commercialization.

    Article  CAS  PubMed  Google Scholar 

  21. Kang, K. et al. High-mobility three-atom-thick semiconducting films with wafer-scale homogeneity. Nature 520, 656–660 (2015). This article reports the preparation of high-mobility monolayer MoS2 and WS2 grown on 4 in. wafers with excellent spatial homogeneity over the entire films.

    Article  CAS  PubMed  Google Scholar 

  22. Li, T. et al. Epitaxial growth of wafer-scale molybdenum disulfide semiconductor single crystals on sapphire. Nat. Nanotechnol. 16, 1201–1207 (2021). This article demonstrates the epitaxial growth of monolayer MoS2 single crystals on a C-plane sapphire.

    Article  CAS  PubMed  Google Scholar 

  23. Liu, L. et al. Uniform nucleation and epitaxy of bilayer molybdenum disulfide on sapphire. Nature 605, 69–75 (2022).

    Article  CAS  PubMed  Google Scholar 

  24. Li, J. et al. General synthesis of two-dimensional van der Waals heterostructure arrays. Nature 579, 368–374 (2020).

    Article  CAS  PubMed  Google Scholar 

  25. Zhang, Z. et al. Endoepitaxial growth of monolayer mosaic heterostructures. Nat. Nanotechnol. 17, 493–499 (2022).

    Article  CAS  PubMed  Google Scholar 

  26. Kim, K. S. et al. Non-epitaxial single-crystal 2D material growth by geometric confinement. Nature 614, 88–94 (2023). This article reports a non-epitaxial strategy to grow single-domain TMDs on amorphous oxides, thus enabling direct growth of single-crystalline 2D materials on an Si wafer coated with an oxide layer.

    Article  CAS  PubMed  Google Scholar 

  27. **ong, X., et al. Demonstration of vertically-stacked CVD monolayer channels: MoS2 nanosheets GAA-FET with Ion > 700 µA/µm and MoS2/WSe2 CFET. In 2021 IEEE International Electron Devices Meeting (IEDM) 7.5.1–7.5.4 (IEEE, 2021).

  28. O’Brien, K. P. et al. Process integration and future outlook of 2D transistors. Nat. Commun. 14, 6400 (2023).

    Article  PubMed  PubMed Central  Google Scholar 

  29. Chung, Y.-Y. et al. First demonstration of GAA monolayer–MoS2 nanosheet nFET with 410 μA μm ID 1 V VD at 40 nm gate length. 2022 International Electron Devices Meeting (IEDM) 34–35 (IEEE, 2022).

  30. Loi, F. et al. Growth mechanism and thermal stability of a MoS2–graphene interface: a high-resolution core-level photoelectron spectroscopy study. J. Phys. Chem. C 124, 20889–20897 (2020).

    Article  CAS  Google Scholar 

  31. Pandey, A. et al. Structural and optical properties of bulk MoS2 for 2D layer growth. Adv. Mater. Lett. 7, 777–782 (2016).

    Article  CAS  Google Scholar 

  32. Jiang, Y. et al. Physical adsorption and oxidation of ultrathin MoS2 crystals: insights into surface engineering for 2D electronics and beyond. Nanotechnology 34, 405701 (2023).

    Article  Google Scholar 

  33. Jiang, J. et al. Ballistic two-dimensional InSe transistors. Nature 616, 470–475 (2023).

    Article  CAS  PubMed  Google Scholar 

  34. Boby, S. M. & Islam, R. MoS2 based TFET: study on channel thickness dependent performance. In 2018 4th International Conference on Electrical Engineering and Information & Communication Technology (iCEEiCT) 449–453 (IEEE, 2018).

  35. Shen, P.-C. et al. Ultralow contact resistance between semimetal and monolayer semiconductors. Nature 593, 211–217 (2021).

    Article  CAS  PubMed  Google Scholar 

  36. Li, W. et al. Approaching the quantum limit in two-dimensional semiconductor contacts. Nature 613, 274–279 (2023).

    Article  CAS  PubMed  Google Scholar 

  37. Wang, Y. et al. P-type electrical contacts for 2D transition-metal dichalcogenides. Nature 610, 61–66 (2022).

    Article  PubMed  Google Scholar 

  38. Liu, Y. et al. Approaching the Schottky–Mott limit in van der Waals metal–semiconductor junctions. Nature 557, 696–700 (2018).

    Article  CAS  PubMed  Google Scholar 

  39. Wang, Y. et al. Van der Waals contacts between three-dimensional metals and two-dimensional semiconductors. Nature 568, 70–74 (2019).

    Article  CAS  PubMed  Google Scholar 

  40. Wang, L. et al. One-dimensional electrical contact to a two-dimensional material. Science 342, 614–617 (2013).

    Article  CAS  PubMed  Google Scholar 

  41. Moon, B. H. et al. Junction-structure-dependent Schottky barrier inhomogeneity and device ideality of monolayer MoS2 field-effect transistors. ACS Appl. Mater. Interfaces 9, 11240–11246 (2017).

    Article  CAS  PubMed  Google Scholar 

  42. Song, S. et al. Atomic transistors based on seamless lateral metal–semiconductor junctions with a sub-1-nm transfer length. Nat. Commun. 13, 4916 (2022).

    Article  CAS  PubMed  PubMed Central  Google Scholar 

  43. Kim, H. G. & Lee, H.-B.-R. Atomic layer deposition on 2D materials. Chem. Mater. 29, 3809–3826 (2017).

    Article  CAS  Google Scholar 

  44. Liu, Y. et al. Promises and prospects of two-dimensional transistors. Nature 591, 43–53 (2021).

    Article  CAS  PubMed  Google Scholar 

  45. English, C. D. et al. Improved contacts to MoS2 transistors by ultra-high vacuum metal deposition. Nano Lett. 16, 3824–3830 (2016).

    Article  CAS  PubMed  Google Scholar 

  46. Gao, L. et al. Silicon-processes-compatible contact engineering for two-dimensional materials integrated circuits. Nano Res. 16, 12471–12490 (2023).

    Article  Google Scholar 

  47. Chou, A.-S. et al. Antimony semimetal contact with enhanced thermal stability for high performance 2D electronics. In 2021 IEEE International Electron Devices Meeting (IEDM) 7.2.1–7.2.4 (IEEE, 2021).

  48. Gu, M. et al. Hybrid low‐k spacer scheme for advanced FinFET technology parasitic capacitance reduction. Electron. Lett. 56, 514–516 (2020).

    Article  CAS  Google Scholar 

  49. Lee, D. et al. Recessed-channel WSe2 field-effect transistor via self-terminated do** and layer-by-layer etching. ACS Nano 16, 8484–8492 (2022).

    Article  CAS  PubMed  Google Scholar 

  50. Kato, R. et al. p-type conversion of WS2 and WSe2 by position-selective oxidation do** and its application in top gate transistors. ACS Appl. Mater. Interfaces 15, 26977–26984 (2023).

    Article  CAS  PubMed  Google Scholar 

  51. Bolshakov, P. et al. Contact engineering for dual-gate MoS2 transistors using O2 plasma exposure. ACS Appl. Electron. Mater. 1, 210–219 (2019).

    Article  CAS  Google Scholar 

  52. Zhao, P. et al. Probing interface defects in top-gated MoS2 transistors with impedance spectroscopy. ACS Appl. Mater. Interfaces 9, 24348–24356 (2017).

    Article  CAS  PubMed  Google Scholar 

  53. Yang, W. et al. The integration of sub-10 nm gate oxide on MoS2 with ultra low leakage and enhanced mobility. Sci. Rep. 5, 11921 (2015).

    Article  PubMed  PubMed Central  Google Scholar 

  54. Zou, X. et al. Interface engineering for high‐performance top‐gated MoS2 field‐effect transistors. Adv. Mater. 26, 6255–6261 (2014).

    Article  CAS  PubMed  Google Scholar 

  55. Kim, H. et al. Ultrathin monolithic HfO2 formed by Hf-seeded atomic layer deposition on MoS2: film characteristics and its transistor application. Thin Solid Films 673, 112–118 (2019).

    Article  CAS  Google Scholar 

  56. Dorow, C. et al. Advancing monolayer 2-D nMOS and pMOS transistor integration from growth to van der Waals interface engineering for ultimate CMOS scaling. IEEE Trans. Electron Devices 68, 6592–6598 (2021).

    Article  CAS  Google Scholar 

  57. Wang, X., Scott, M. T. & Dai, H. Atomic layer deposition of metal oxides on pristine and functionalized graphene. J. Am. Chem. Soc. 130, 8152–8153 (2008).

    Article  CAS  PubMed  Google Scholar 

  58. Li, W. et al. Uniform and ultrathin high-κ gate dielectrics for two-dimensional electronic devices. Nat. Electron. 2, 563–571 (2019).

    Article  CAS  Google Scholar 

  59. Xu, Y. et al. Scalable integration of hybrid high-κ dielectric materials on two-dimensional semiconductors. Nat. Mater. 22, 1078–1084 (2023).

    Article  CAS  PubMed  Google Scholar 

  60. Park, Y. H. et al. Enhanced nucleation of high-k dielectrics on graphene by atomic layer deposition. Chem. Mater. 28, 7268–7275 (2016).

    Article  CAS  Google Scholar 

  61. Fisichella, G. et al. Interface electrical properties of Al2O3 thin films on graphene obtained by atomic layer deposition with an in situ seedlike layer. ACS Appl. Mater. Interfaces 9, 7761–7771 (2017).

    Article  CAS  PubMed  Google Scholar 

  62. Lin, Y.-S. et al. Atomic layer deposition of sub-10 nm high-K gate dielectrics on top-gated MoS2 transistors without surface functionalization. Appl. Surf. Sci. 443, 421–428 (2018).

    Article  CAS  Google Scholar 

  63. Lin, D., et al. Dual gate synthetic WS2 MOSFETs with 120 μS/μm Gm 2.7 μF/cm2 capacitance and ambipolar channel. In 2020 IEEE International Electron Devices Meeting (IEDM) 3.6.1–3.6.4 (IEEE, 2020).

  64. Wu, X., et al. Dual gate synthetic MoS2 MOSFETs with 4.56 µF/cm2 channel capacitance, 320 µS/µm Gm and 420 µA/µm Id at 1 V Vd/100 nm Lg. In 2021 IEEE International Electron Devices Meeting (IEDM) 7.4.1–7.4.4 (IEEE, 2021).

  65. Liu, K. et al. A wafer-scale van der Waals dielectric made from an inorganic molecular crystal film. Nat. Electron. 4, 906–913 (2021).

    Article  CAS  Google Scholar 

  66. Lai, S. et al. HfO2/HfS2 hybrid heterostructure fabricated via controllable chemical conversion of two-dimensional HfS2. Nanoscale 10, 18758–18766 (2018).

    Article  CAS  PubMed  Google Scholar 

  67. Zhang, Y. et al. A single-crystalline native dielectric for two-dimensional semiconductors with an equivalent oxide thickness below 0.5 nm. Nat. Electron. 5, 643–649 (2022).

    Article  CAS  Google Scholar 

  68. Yang, A. J. et al. Van der Waals integration of high-κ perovskite oxides and two-dimensional semiconductors. Nat. Electron. 5, 233–240 (2022).

    Article  CAS  Google Scholar 

  69. Lu, Z. et al. Wafer-scale high-κ dielectrics for two-dimensional circuits via van der Waals integration. Nat. Commun. 14, 2340 (2023).

    Article  CAS  PubMed  PubMed Central  Google Scholar 

  70. Britnell, L. et al. Electron tunneling through ultrathin boron nitride crystalline barriers. Nano Lett. 12, 1707–1710 (2012).

    Article  CAS  PubMed  Google Scholar 

  71. Knobloch, T. et al. The performance limits of hexagonal boron nitride as an insulator for scaled CMOS devices based on two-dimensional materials. Nat. Electron. 4, 98–108 (2021).

    Article  CAS  Google Scholar 

  72. Fleetwood, D. M. et al. Effects of oxide traps, interface traps, and ‘border traps’ on metal–oxide–semiconductor devices. J. Appl. Phys. 73, 5058–5074 (1993).

    Article  CAS  Google Scholar 

  73. Zhao, P. et al. Evaluation of border traps and interface traps in HfO2/MoS2 gate stacks by capacitance–voltage analysis. 2D Mater. 5, 031002 (2018).

    Article  Google Scholar 

  74. Illarionov, Y. Y. et al. Energetic map** of oxide traps in MoS2 field-effect transistors. 2D Mater. 4, 025108 (2017).

    Article  Google Scholar 

  75. Knobloch, T. et al. Improving stability in two-dimensional transistors with amorphous gate oxides by Fermi-level tuning. Nat. Electron. 5, 356–366 (2022).

    Article  CAS  PubMed  PubMed Central  Google Scholar 

  76. O’Brien, K. P., et al. Advancing 2D monolayer CMOS through contact, channel and interface engineering. In 2021 IEEE International Electron Devices Meeting (IEDM) 7.1.1–7.1.4 (IEEE, 2021).

  77. Smets, Q., et al. Scaling of double-gated WS2 FETs to sub-5 nm physical gate length fabricated in a 300 mm FAB. In 2021 IEEE International Electron Devices Meeting (IEDM) 34.2.1–34.2.4 (IEEE, 2021).

  78. Schram, T., et al. High yield and process uniformity for 300 mm integrated WS2 FETs. In 2021 Symposium on VLSI Technology 1–2 (IEEE, 2021).

  79. Hung, T. Y. T., et al. Pinning-free edge contact monolayer MoS2 FET. In 2020 IEEE International Electron Devices Meeting (IEDM) 3.3.1–3.3.4 (IEEE, 2020).

  80. Nguyen, V. L. et al. Wafer-scale integration of transition metal dichalcogenide field-effect transistors using adhesion lithography. Nat. Electron. 6, 146–153 (2023).

    Article  CAS  Google Scholar 

  81. Sohn, A. et al. Precise layer control and electronic state modulation of a transition metal dichalcogenide via phase‐transition‐induced growth. Adv. Mater. 34, 2103286 (2022).

    Article  CAS  Google Scholar 

  82. Seol, M. et al. High‐throughput growth of wafer‐scale monolayer transition metal dichalcogenide via vertical Ostwald ripening. Adv. Mater. 32, 2003542 (2020). This article reports high-throughput growth of wafer-scale monolayer MoS2 and WS2.

    Article  CAS  Google Scholar 

  83. Jang, H. et al. An atomically thin optoelectronic machine vision processor. Adv. Mater. 32, 2002431 (2020).

    Article  CAS  Google Scholar 

  84. Gao, C. et al. Defect evolution behaviors from single sulfur point vacancies to line vacancies in monolayer molybdenum disulfide. Phys. Chem. Chem. Phys. 23, 19525–19536 (2021).

    Article  CAS  PubMed  Google Scholar 

  85. Mignuzzi, S. et al. Effect of disorder on Raman scattering of single-layer MoS2. Phys. Rev. B 91, 195411 (2015).

    Article  Google Scholar 

  86. Chow, P. K. et al. Defect-induced photoluminescence in monolayer semiconducting transition metal dichalcogenides. ACS Nano 9, 1520–1527 (2015).

    Article  CAS  PubMed  Google Scholar 

  87. Ermolaev, G. A. et al. Broadband optical properties of monolayer and bulk MoS2. npj 2D Mater. Appl. 4, 21 (2020).

    Article  CAS  Google Scholar 

  88. Syari’ati, A. et al. Photoemission spectroscopy study of structural defects in molybdenum disulfide (MoS2) grown by chemical vapor deposition (CVD). Chem. Commun. 55, 10384–10387 (2019).

    Article  Google Scholar 

  89. Ma, N. & Jena, D. Charge scattering and mobility in atomically thin semiconductors. Phys. Rev. 4, 011043 (2014).

    Article  CAS  Google Scholar 

  90. Yalon, E. et al. Energy dissipation in monolayer MoS2 electronics. Nano Lett. 17, 3429–3433 (2017).

    Article  CAS  PubMed  Google Scholar 

  91. Noel, J.-P. et al. Multi-VT UTBB FDSOI device architectures for low-power CMOS circuit. IEEE Trans. Electron Devices 58, 2473–2482 (2011).

    Article  CAS  Google Scholar 

  92. Yoon, J.-S. et al. Multi-Vth strategies of 7-nm node nanosheet FETs with limited nanosheet spacing. IEEE J. Electron Devices Soc. 6, 861–865 (2018).

    Article  CAS  Google Scholar 

  93. Schwierz, F. & Liou, J. J. Status and future prospects of CMOS scaling and Moore’s law—a personal perspective. In 2020 IEEE Latin America Electron Devices Conference (LAEDC) 1–4 (IEEE, 2020).

  94. Radisavljevic, B. et al. Single-layer MoS2 transistors. Nat. Nanotechnol. 6, 147–150 (2011). This article reports a realization of a field-effect transistor with a single, two-dimensional layer of the semiconductor MoS2.

    Article  CAS  PubMed  Google Scholar 

  95. Zhan, Y. et al. Large‐area vapor‐phase growth and characterization of MoS2 atomic layers on a SiO2 substrate. Small 8, 966–971 (2012).

    Article  CAS  PubMed  Google Scholar 

  96. Han, G. H. et al. Seeded growth of highly crystalline molybdenum disulphide monolayers at controlled locations. Nat. Commun. 6, 6128 (2015).

    Article  CAS  PubMed  Google Scholar 

  97. Wang, P. et al. Arrayed van der Waals broadband detectors for dual‐band detection. Adv. Mater. 29, 1604439 (2017).

    Article  Google Scholar 

  98. Li, Y. et al. Site-specific positioning and patterning of MoS2 monolayers: the role of Au seeding. ACS Nano 12, 8970–8976 (2018).

    Article  CAS  PubMed  Google Scholar 

  99. Zhu, J. et al. Low-thermal-budget synthesis of monolayer molybdenum disulfide for silicon back-end-of-line integration on a 200 mm platform. Nat. Nanotechnol. 18, 456–463 (2023).

    Article  CAS  PubMed  Google Scholar 

  100. Fang, H. et al. High-performance single layered WSe2 p-FETs with chemically doped contacts. Nano Lett. 12, 3788–3792 (2012).

    Article  CAS  PubMed  Google Scholar 

  101. Kappera, R. et al. Phase-engineered low-resistance contacts for ultrathin MoS2 transistors. Nat. Mater. 13, 1128–1134 (2014).

    Article  CAS  PubMed  Google Scholar 

  102. Azcatl, A. et al. MoS2 functionalization for ultrathin atomic layer deposited dielectrics. Appl. Phys. Lett. 104, 111601 (2014).

    Article  Google Scholar 

  103. Cheng, L. et al. Atomic layer deposition of a high-k dielectric on MoS2 using trimethylaluminum and ozone. ACS Appl. Mater. Interfaces 6, 11834–11838 (2014).

    Article  CAS  PubMed  PubMed Central  Google Scholar 

  104. Wang, H. et al. Integrated circuits based on bilayer MoS2 transistors. Nano Lett. 12, 4674–4680 (2012).

    Article  CAS  PubMed  Google Scholar 

  105. Chen, M.-C., et al. TMD FinFET with 4 nm thin body and back gate control for future low power technology. In 2015 IEEE International Electron Devices Meeting (IEDM) 32.2.1–32.2.4 (IEEE, 2015).

  106. Wachter, S. et al. A microprocessor based on a two-dimensional semiconductor. Nat. Commun. 8, 14948 (2017).

    Article  CAS  PubMed  PubMed Central  Google Scholar 

  107. Huang, X., et al. High drive and low leakage current MBC FET with channel thickness 1.2 nm/0.6 nm. 2020 IEEE International Electron Devices Meeting (IEDM) 12.1.1–12.1.4 (IEEE, 2020).

  108. **ong, X., et al. Top-gate CVD WSe2 pFETs with record-high Id ~ 594 μA/μm, Gm ~ 244 μS/μm and WSe2/MoS2 CFET based half-adder circuit using monolithic 3D integration. In 2022 International Electron Devices Meeting (IEDM) 20–26 (IEEE, 2022).

  109. Choi, M. S. et al. Recent progress in 1D contacts for 2D‐material‐based devices. Adv. Mater. 34, 2202408 (2022).

    Article  CAS  Google Scholar 

  110. Smithe, K. K. H., Suryavanshi, S. V., Munoz Rojo, M., Tedjarati, A. D. & Pop, E. Low variability in synthetic monolayer MoS2 devices. ACS Nano 11, 8456–8463 (2017).

    Article  CAS  PubMed  Google Scholar 

  111. Chou, A. S. et al. High on-state current in chemical vapor deposited monolayer MoS2 nFETs with Sn ohmic contacts. IEEE Electron Device Lett. 42, 272–275 (2021).

    Article  CAS  Google Scholar 

  112. Yang, L. et al. Chloride molecular do** technique on 2D materials: WS2 and MoS2. Nano Lett. 14, 6275–6280 (2014).

    Article  CAS  PubMed  Google Scholar 

  113. McClellan, J. et al. High current density in monolayer MoS2 doped by AlOx. ACS Nano 15, 1587–1596 (2021).

    Article  CAS  PubMed  Google Scholar 

  114. Cheng, Z. et al. Immunity to contact scaling in MoS2 transistors using in situ edge contacts. Nano Lett. 19, 5077–5085 (2019).

    Article  CAS  PubMed  Google Scholar 

  115. **ao, J. et al. Record-high saturation current in end-bond contacted monolayer MoS2 transistors. Nano Res. 15, 475–481 (2022).

    Article  CAS  Google Scholar 

  116. Guimaraes, M. H. D. et al. Atomically thin ohmic edge contacts between two-dimensional materials. ACS Nano 10, 6392–6399 (2016).

    Article  CAS  PubMed  Google Scholar 

Download references

Acknowledgements

This material is based on work supported by AFOSR (award no. FA9550-22-1-0024) and DARPA (award no. D19AP00037-07).

Author information

Author notes

  1. These authors contributed equally: Ki Seok Kim, Junyoung Kwon, Huije Ryu, Changhyun Kim, Hyunseok Kim.

Authors and Affiliations

  1. Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, MA, USA

    Ki Seok Kim, Hyunseok Kim, Seunghwan Seo, Ne Myo Han, Jun Min Suh, Jekyung Kim, Min-Kyu Song, Sangho Lee & Jeehwan Kim

  2. Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, MA, USA

    Ki Seok Kim, Doyoon Lee, Seunghwan Seo, Ne Myo Han, Jun Min Suh, Jekyung Kim, Min-Kyu Song, Sangho Lee & Jeehwan Kim

  3. Samsung Advanced Institute of Technology, Samsung Electronics Co. Ltd, Suwon, Korea

    Junyoung Kwon, Huije Ryu, Changhyun Kim, Eun-Kyu Lee, Minsu Seol & Jeehwan Kim

  4. Department of Electrical and Computer Engineering, University of Illinois Urbana-Champaign, Urbana, IL, USA

    Hyunseok Kim

  5. Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA, USA

    Doyoon Lee & Jeehwan Kim

Authors
  1. Ki Seok Kim
    View author publications

    You can also search for this author in PubMed Google Scholar

  2. Junyoung Kwon
    View author publications

    You can also search for this author in PubMed Google Scholar

  3. Huije Ryu
    View author publications

    You can also search for this author in PubMed Google Scholar

  4. Changhyun Kim
    View author publications

    You can also search for this author in PubMed Google Scholar

  5. Hyunseok Kim
    View author publications

    You can also search for this author in PubMed Google Scholar

  6. Eun-Kyu Lee
    View author publications

    You can also search for this author in PubMed Google Scholar

  7. Doyoon Lee
    View author publications

    You can also search for this author in PubMed Google Scholar

  8. Seunghwan Seo
    View author publications

    You can also search for this author in PubMed Google Scholar

  9. Ne Myo Han
    View author publications

    You can also search for this author in PubMed Google Scholar

  10. Jun Min Suh
    View author publications

    You can also search for this author in PubMed Google Scholar

  11. Jekyung Kim
    View author publications

    You can also search for this author in PubMed Google Scholar

  12. Min-Kyu Song
    View author publications

    You can also search for this author in PubMed Google Scholar

  13. Sangho Lee
    View author publications

    You can also search for this author in PubMed Google Scholar

  14. Minsu Seol
    View author publications

    You can also search for this author in PubMed Google Scholar

  15. Jeehwan Kim
    View author publications

    You can also search for this author in PubMed Google Scholar

Corresponding authors

Correspondence to Minsu Seol or Jeehwan Kim.

Ethics declarations

Competing interests

The authors declare no competing interests.

Peer review

Peer review information

Nature Nanotechnology thanks Peng Zhou, Zheng Zhang and **ang Chen for their contribution to the peer review of this work.

Additional information

Publisher’s note Springer Nature remains neutral with regard to jurisdictional claims in published maps and institutional affiliations.

Rights and permissions

Springer Nature or its licensor (e.g. a society or other partner) holds exclusive rights to this article under a publishing agreement with the author(s) or other rightsholder(s); author self-archiving of the accepted manuscript version of this article is solely governed by the terms of such publishing agreement and applicable law.

Reprints and permissions

About this article

Check for updates. Verify currency and authenticity via CrossMark

Cite this article

Kim, K.S., Kwon, J., Ryu, H. et al. The future of two-dimensional semiconductors beyond Moore’s law. Nat. Nanotechnol. (2024). https://doi.org/10.1038/s41565-024-01695-1

Download citation

  • Received:

  • Accepted:

  • Published:

  • DOI: https://doi.org/10.1038/s41565-024-01695-1

  • Springer Nature Limited

Search

Navigation