SpringerLink
Log in

Microstructure and secular instability of the (Ti1 − x,Alx)N films prepared by ion-beam-assisted-deposition

  • Published:
Journal of Materials Science Aims and scope Submit manuscript

Abstract

(Ti1 − x ,Al x )N films were prepared by ion beam assisted deposition (IBAD). The films were synthesized by depositing titanium and aluminum metal individual vapor under simultaneous bombardment with nitrogen ions in the energy range of 0.2–20 keV with the (Ti1 − x ,Al x )/N transport ratio in the range of 0.5–2.0. The films were formed onto Si(111) wafers at room temperature. Structural characterization of the films was performed with x-ray diffraction and selected area electron diffraction. The crystalline structure of the (Ti0.64,Al0.36)N and (Ti0.33,Al0.67)N films were found to be a metastable single-phase B1-NaCl structure. The (Ti0.29,Al0.71)N films revealed a two-phase mixture consisting of NaCl and würtzite structural phases. The AlN solubility limit into TiN, which approximately equal with x value, calculated by using electron theory was about x = 0.65, which shows good agreement to the experimental results. Phase separation after half a year of aging at room temperature in air was observed on the (Ti0.33,Al0.67) films whose AlN content is close to the solubility limits.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Log in via an institution

Subscribe and save

Springer+ Basic
EUR 32.99 /Month
  • Get 10 units per month
  • Download Article/Chapter or Ebook
  • 1 Unit = 1 Article or 1 Chapter
  • Cancel anytime
Subscribe now

Buy Now

Price includes VAT (Germany)

Instant access to the full article PDF.

Institutional subscriptions

Similar content being viewed by others

References

  1. M. Wittmer, J. Noster and H. Melchior, J. Appl. Phys. 52 (1981) 6659.

    Google Scholar 

  2. O. Knotek, M. BÖhmer and T. Leyendecker, J. Vac. Sci. Technol. A4 (1986) 2695.

    Google Scholar 

  3. T. Leyendecker, O. Lemmer, S. Esser and J. Ebberink, Surf. Coat. Technol. 48 (1991) 175.

    Google Scholar 

  4. W. D. MÑnz, J. Vac. Sci. Technol. A4 (1986) 2717.

    Google Scholar 

  5. H. Ichimura and A. Kawana, J. Mater. Res. 8 (1993) 1093.

    Google Scholar 

  6. T. Ikeda and H. Satoh, Thin Solid Films 195 (1991) 99.

    Google Scholar 

  7. U. WahlstrÖm, L. Hultman, J.-E. Sundgren, F. Adibi, I. Petrov and J. E. Greene, ibid. 235 (1993) 62.

    Google Scholar 

  8. J. C. Schuster and J. Bauer, J. Solid State Chem. 53 (1984) 260.

    Google Scholar 

  9. S. Miyake, K. Honda, T. Kohno, Y. Setsuhara, A. Chayahara and M. Satou, J. Vac. Sci. Technol. A10 (1992) 3253.

    Google Scholar 

  10. T. J. Bell, J. S. Field and M. V. Swan, Materials Forum 17 (1993) 127.

    Google Scholar 

  11. T. J. Bell, A. Bendeli, J. S. Field, M. V. Swan and E. G. Thwaite, Metrologia 28 (1991/92) 463.

    Google Scholar 

  12. Y. Setsuhara, H. Ohsako, Y. Makino and S. Miyake, Surf. Coat. Technol. 66 (1994) 495.

    Google Scholar 

  13. Y. Setsuhara, T. Suzuki, Y. Makino, S. Miyake, T. Sakata and H. Mori, ibid. 97 (1997) 254.

    Google Scholar 

  14. Y. Makino, Y. Setsuhara and S. Miyake, in Proc. 9th Intl. Conf. on Ion Beam Modification of Materials, Canberra, Australia, February, 1995, p. 735.

  15. A. Zunger, Phys. Rev. B22 (1980) 5839.

    Google Scholar 

  16. W. A. Harrison, “Electronic Structure and The Properties of Solids” (Freeman, San Francisco, CA, 1980) Ch. 3.

    Google Scholar 

  17. Y. Makino, Mater. Sci. and Eng. A192/193 (1995) 77.

    Google Scholar 

  18. Idem., Intermetallics 2 (1994) 55.

    Google Scholar 

  19. Idem., Mater. Sci. and Eng. A179/180 (1994) 238.

    Google Scholar 

  20. A. Sugishima, H. Kajioka and Y. Makino, Surf. Coat. Technol. 97 (1997) 590.

    Google Scholar 

  21. Y. Makino and K. Nogi, ibid. 98 (1998) 1008.

    Google Scholar 

  22. Y. Makino, Mater. Sci. Eng. A192/193 (1995) 77.

    Google Scholar 

  23. J. R. Roos, J. P. Celis, E. Vancoille, H. Veltrop, S. Boelens, F. Jungblut, J. Ebberink and H. Homberg, Thin Solids Films 193/194 (1990) 547.

    Google Scholar 

  24. Y. Tanaka, T. M. GÑr, M. Kelly, S. B. Hagstrom and T. Ikeda, ibid. 228 (1993) 238.

    Google Scholar 

  25. M. L. Cohen, Phys. Rev. B32 (1985) 7988.

    Google Scholar 

  26. Y. Makino, J. Alloys and Comp. 242 (1996) 122.

    Google Scholar 

Download references

Author information

Authors and Affiliations

  1. Joining and Welding Research Institute, Osaka University, 11-1, Mihogaoka, Ibaraki, Osaka, 567-0047, Japan

    T. Suzuki

  2. Joining and Welding Research Institute, Osaka University, 11-1, Mihogaoka, Ibaraki, Osaka, 567-0047, Japan

    Y. Makino & S. Miyake

  3. Surface Engineering Research Center, University of Wollongong, Northfields Avenue, Wollongong, 2500, Australia

    M. Samandi

Authors
  1. T. Suzuki
    View author publications

    You can also search for this author in PubMed Google Scholar

  2. Y. Makino
    View author publications

    You can also search for this author in PubMed Google Scholar

  3. M. Samandi
    View author publications

    You can also search for this author in PubMed Google Scholar

  4. S. Miyake
    View author publications

    You can also search for this author in PubMed Google Scholar

Rights and permissions

Reprints and permissions

About this article

Cite this article

Suzuki, T., Makino, Y., Samandi, M. et al. Microstructure and secular instability of the (Ti1 − x,Alx)N films prepared by ion-beam-assisted-deposition. Journal of Materials Science 35, 4193–4199 (2000). https://doi.org/10.1023/A:1004835111782

Download citation

  • Issue Date:

  • DOI: https://doi.org/10.1023/A:1004835111782

Keywords

Search

Navigation