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Plasma Sprayed Coatings of High-Purity Ceramics for Semiconductor and Flat-Panel-Display Production Equipment

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Abstract

High-purity oxide ceramic powders of alumina (Al2O3) and yttria (Y2O3) have been developed to apply to semiconductor and flat-panel-display (FPD) production equipment. The ceramic coatings on the inside chamber wall of the equipment are required to have high erosion resistance against CFx plasma in dry etching process for microfabrications of the devices. It is found that the yttria coating formed from agglomerated-and-sintered powder consisting of large primary particles has smoother eroded surface with high erosion resistance. Considering the particle deposition on the devices, this coating will be effective in decreasing generation of large-sized particles, which easily deposit on the devices. Electric insulating properties of the coatings are also investigated to apply to electrostatic chuck. Electric breakdown voltage of yttria coatings is comparable to that of alumina coatings. Smaller powder is effective for improving the electric properties, and the influence of coating purity is lower than that of the powder size.

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Authors and Affiliations

  1. Thermal Spray Materials Department, Fujimi Incorporated, Kakamigahara, Gifu Pref., 509-0103, Japan

    Junya Kitamura, Hiroyuki Ibe, Fumi Yuasa & Hiroaki Mizuno

Authors
  1. Junya Kitamura
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  2. Hiroyuki Ibe
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  3. Fumi Yuasa
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  4. Hiroaki Mizuno
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Corresponding author

Correspondence to Junya Kitamura.

Additional information

This article is an invited paper selected from presentations at the 2008 International Thermal Spray Conference and has been expanded from the original presentation. It is simultaneously published in Thermal Spray Crossing Borders, Proceedings of the 2008 International Thermal Spray Conference, Maastricht, The Netherlands, June 2-4, 2008, Basil R. Marple, Margaret M. Hyland, Yuk-Chiu Lau, Chang-Jiu Li, Rogerio S. Lima, and Ghislain Montavon, Ed., ASM International, Materials Park, OH, 2008.

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Kitamura, J., Ibe, H., Yuasa, F. et al. Plasma Sprayed Coatings of High-Purity Ceramics for Semiconductor and Flat-Panel-Display Production Equipment. J Therm Spray Tech 17, 878–886 (2008). https://doi.org/10.1007/s11666-008-9285-y

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  • DOI: https://doi.org/10.1007/s11666-008-9285-y

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