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Rapid epitaxial growth of conducting and insulating III-V compounds on (001), (110), (111)A, (311)A, and (311)B surfaces by hydride vapor phase epitaxy

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Abstract

Rapid growth of conducting or insulating InP, GaAs, Ga0.47In0.53As, and GaAs0.6P0.4 on one or more of substrates of orientations (001), (110), (111)A, (311)A, and (311)B by hydride vapor phase epitaxy (HVPE) is demonstrated. The maximum growth rate of the binaries lies between 12 and 300 µm/h and that of the ternaries between 7 and 170 µm/h. A simple model is developed to describe the influence of crystallographic orientation on temperature-dependent growth rates. The model is compared with the experimental data. Room-temperature resistivity of insulating InP:Fe can be as high as 5 × 109 ohm cm. Temperature-dependent differential resistivity is also analyzed. This feasibility of growing conducting and insulating layers rapidly on substrates of different orientations is very useful for electronic and optoelectronic devices.

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Authors and Affiliations

  1. the Laboratory of Semiconductor Materials, Department of Electronics, Royal Institute of Technology, S-164 40, Kista, Sweden

    S. Lourdudoss, N. Gopalakrishnan & R. Holz

  2. Aixtron Semiconductor Technologies GmbH, D-52072, Aachen, Germany

    M. Deschler & R. Beccard

Authors
  1. S. Lourdudoss
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  2. N. Gopalakrishnan
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  3. R. Holz
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  4. M. Deschler
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  5. R. Beccard
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Lourdudoss, S., Gopalakrishnan, N., Holz, R. et al. Rapid epitaxial growth of conducting and insulating III-V compounds on (001), (110), (111)A, (311)A, and (311)B surfaces by hydride vapor phase epitaxy. Metall Mater Trans A 30, 1047–1051 (1999). https://doi.org/10.1007/s11661-999-0157-y

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  • DOI: https://doi.org/10.1007/s11661-999-0157-y

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