Abstract
With confined space dissolution and recrystallization (CSDR) of assembled silicalite-1 nanosheets, a high-quality thin b-oriented silicalite-1 membrane was successfully fabricated on a platinum-coated silicon wafer. The effects of several synthetic parameters such as the concentration of tetrapropylammonium cation (TPA+) in the synthesis composition, crystallization time (8–40 h) and methods of seed deposition on the silicon wafer were investigated in detail. A new face-to-face rubbing seed assembly method was determined to favor the smoother and more homogenous film. a uniform b-oriented silicalite-1 thin membrane was obtained with a thickness of ~ 100 nm at 185 °C for 40 h under optimized TPA+/H2O ratio of 0.15. We demonstrated that the CSDR method is favorable to prepare the thin b-oriented membrane.
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Acknowledgements
X. G. gratefully acknowledges support from National Natural Science Foundation of China (No. 22078235). J. L. gratefully acknowledges support from China Postdoctoral Science Foundation (2019M661022 and 2021T140509) and National Natural Science Foundation of China (Nos. 22008176).
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Luo, R., Ni, X., Bai, P. et al. Fabrication of b-oriented silicalite-1 membrane by confined space dissolution and recrystallization. J Porous Mater 29, 423–431 (2022). https://doi.org/10.1007/s10934-021-01194-x
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DOI: https://doi.org/10.1007/s10934-021-01194-x