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Study of Structural and Mechanical Properties of WN/a-Si3N4 Hard Coatings Grown by Plasma Focus

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Abstract

WN/a-Si3N4 thin films have been synthesized by utilizing the energetic ion/electron species emanated from hot, dense pinched plasma column in UNU/ICTP plasma focus operated with nitrogen gas. Structural, chemical, morphological and mechanical properties of synthesized films are studied using X-ray diffraction (XRD), X-ray photoelectron spectroscopic (XPS), field emission scanning electron microscopy (FESEM) and nano-indentation respectively. XRD spectra show WN2, WN, WSi2 phases on exposed samples. XPS results confirm W–Si–N chemical bonding in synthesized films. FESEM micrographs show uniform granular structure of synthesized WN/a-Si3N4 thin films. Surface morphology of synthesized thin films shows that increase in focus shots strongly affects the grain size due to change in ion energy flux. Nano-indentation results show significant increase in hardness with increase in focus shots with maximum hardness of 23.5 ± 1 GPa is observed for 45 focus shots.

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Acknowledgments

One of the authors (Ali Hussnain) would like to thank Higher Education Commission, Pakistan, for providing financial support to conduct this research at Natural Sciences and Science Education, National Institute of Education, Nanyang Technological University (NTU) Singapore.

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Correspondence to Riaz Ahmad.

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Hussnain, A., Rawat, R.S., Seng, T.K. et al. Study of Structural and Mechanical Properties of WN/a-Si3N4 Hard Coatings Grown by Plasma Focus. J Fusion Energ 34, 435–442 (2015). https://doi.org/10.1007/s10894-014-9813-3

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