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line (852 nm) and a width of about 120 nm and covering a large area of approximately 1 mm2.
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Received: 3 July 1997/Accepted: 7 July 1997
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Lison, F., Adams, HJ., Haubrich, D. et al. Nanoscale atomic lithography with a cesium atomic beam. Appl Phys B 65, 419–421 (1997). https://doi.org/10.1007/s003400050290
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DOI: https://doi.org/10.1007/s003400050290