Abstract
The development of a novel self-aligned photolithographic process is reported enabling selective Ti-deposition on the surface of wet etched ridges on lithium niobate. Thus local diffusion do** of the ridges becomes possible to fabricate optical waveguides. They have surprisingly low propagation losses down to 0.05 dB/cm for TE-polarization (at ∼1.55 μm wavelength). The fabrication procedure of locally doped ridge guides in LN and their optical properties are presented in detail.
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Hu, H., Ricken, R. & Sohler, W. Low-loss ridge waveguides on lithium niobate fabricated by local diffusion do** with titanium. Appl. Phys. B 98, 677–679 (2010). https://doi.org/10.1007/s00340-010-3908-y
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DOI: https://doi.org/10.1007/s00340-010-3908-y