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Magnetic field penetration in niobium- and vanadium-based Josephson junctions

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Abstract

Measurements on the temperature dependence of the magnetic field penetration in Nb-NbxOy-Pb and V-VxOy-Pb Josephson junctions have been performed. Results on the zero-temperature penetration depth in niobium films are far above the bulk values although consistent with other measurements on junctions reported in the literature. For vanadium junctions anomalously large penetration depth values are obtained at low temperatures. Nevertheless, the temperature dependence is in reasonable agreement with the local dirty limit model.

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Authors and Affiliations

  1. Istituto di Fisica dell'Università di Salerno, Salernox, Italy

    A. M. Cucolo, S. Pace & R. Vaglio

  2. Istituto di Fisica della Facoltà di Ingegneria, Università di Napoli, Naples, Italy

    A. Di Chiara & G. Peluso

  3. Istituto di Cibernetica del Consiglio Nazionale delle Ricerche, Arco Felice (NA), Italy

    M. Russo

Authors
  1. A. M. Cucolo
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  2. S. Pace
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  3. R. Vaglio
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  4. A. Di Chiara
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  5. G. Peluso
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  6. M. Russo
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Additional information

This work was partially supported by the Consiglio Nazionale delle Ricerche under the Progetto Finalizzato Superconduttività.

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Cucolo, A.M., Pace, S., Vaglio, R. et al. Magnetic field penetration in niobium- and vanadium-based Josephson junctions. J Low Temp Phys 50, 301–310 (1983). https://doi.org/10.1007/BF00681607

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  • DOI: https://doi.org/10.1007/BF00681607

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